In this article, an integrated thermopile vacuum gauge with an XeF₂ dry-etching process is presented. The integrated thermopile vacuum gauge consists of an N-polysilicon heater and 38 N-polysilicon/Al thermocouples. By using XeF₂ front-side isotropic post-etching technique, the integrated vacuum gauge structure was released, and a small size of the integrated thermopile vacuum gauge structure about 0.4 x 1.5 mm² has been achieved. Compared with applying a constant voltage to the integrated thermopile vacuum gauge, applying a constant power to the gauge is more sensitive. The experimental results show that the dynamic pressure range of the integrated thermopile vacuum sensor is 10^–2–10⁵ Pa.