Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering, Volume 240, Issue 3, Page 2661-2674, June 2026.
In the present study, δ-TaN thin films were deposited by reactive magnetron sputtering (physical vapour deposition) on Ti6Al7Nb alloy by varying the deposition pressure (0.8–0.2 Pa). Their crystalline structure, chemical composition, surface roughness, ...